Bottom-ARC optimization methodology for 0.25μm lithography and beyond

Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes

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Bottom-ARC optimization methodology for 0.25μm lithography and beyond

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1998

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Van Puyenbroeck, Ilse

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Ronse, Kurt

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Lamb, J. E.

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van der Hilst, J. B. C.

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van Wingerden, Johannes

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2036 since deposited on 2021-10-01

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Bottom-ARC optimization methodology for 0.25μm lithography and beyond

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