Publication:

Development of non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography

Date

2009

Proceedings Paper

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Files

19644.pdf 516.16 KB

Author(s)

Lawrie, Kirsten

;

;

;

;

;

Pollentier, Ivan

;

Leeson, Michael

;

Younkin, Todd R.

;

Whittaker, Andrew K.

Statistics

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Acq. date: 2026-10-07