Publication:

Extended Methodology to Determine SRAM Write Margin in Resistance-Dominated Technology Node

 
dc.contributor.authorLiu, Hsiao-Hsuan
dc.contributor.authorSalahuddin, Shairfe Muhammad
dc.contributor.authorAbdi, Dawit
dc.contributor.authorChen, Rongmei
dc.contributor.authorWeckx, Pieter
dc.contributor.authorMatagne, Philippe
dc.contributor.authorCatthoor, Francky
dc.contributor.imecauthorLiu, Hsiao-Hsuan
dc.contributor.imecauthorSalahuddin, Shairfe Muhammad
dc.contributor.imecauthorAbdi, Dawit
dc.contributor.imecauthorChen, Rongmei
dc.contributor.imecauthorWeckx, Pieter
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorCatthoor, Francky
dc.contributor.orcidimecAbdi, Dawit::0000-0002-3598-8798
dc.contributor.orcidimecCatthoor, Francky::0000-0002-3599-8515
dc.contributor.orcidimecSalahuddin, Shairfe Muhammad::0000-0002-6483-8430
dc.date.accessioned2023-05-16T12:57:32Z
dc.date.available2022-05-04T02:17:53Z
dc.date.available2023-05-16T12:57:32Z
dc.date.embargo2024-04-22
dc.date.issued2022
dc.identifier.doi10.1109/TED.2022.3165738
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39729
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
dc.source.beginpage3113
dc.source.endpage3117
dc.source.issue6
dc.source.journalIEEE TRANSACTIONS ON ELECTRON DEVICES
dc.source.numberofpages5
dc.source.volume69
dc.title

Extended Methodology to Determine SRAM Write Margin in Resistance-Dominated Technology Node

dc.typeJournal article
dspace.entity.typePublication
Files

Original bundle

Name:
tr_ed22samantha_rev.pdf
Size:
383.43 KB
Format:
Adobe Portable Document Format
Description:
Accepted version
Publication available in collections: