Publication:

Crystallinity and composition of Sc1-x(-y)SixP(y) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applications

Date

2024
Journal article
https://doi.org/10.35848/1347-4065/ad1f0d
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dc.contributor.authorPollefliet, Bert
dc.contributor.authorPorret, Clément
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorSankaran, Kiroubanand
dc.contributor.authorPiao, Xiaoyu
dc.contributor.authorRosseel, Erik
dc.contributor.authorConard, Thierry
dc.contributor.authorImpagnatiello, Andrea
dc.contributor.authorShimura, Yosuke
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLoo, Roger
dc.contributor.authorVantomme, Andre
dc.contributor.authorMerckling, Clement
dc.contributor.imecauthorPollefliet, Bert
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorSankaran, Kiroubanand
dc.contributor.imecauthorPiao, Xiaoyu
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorImpagnatiello, Andrea
dc.contributor.imecauthorShimura, Yosuke
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMerckling, Clement
dc.contributor.imecauthorPorret, Clément
dc.contributor.orcidimecPollefliet, Bert::0000-0003-3663-8842
dc.contributor.orcidimecEveraert, Jean-Luc::0000-0002-0660-9090
dc.contributor.orcidimecSankaran, Kiroubanand::0000-0001-6988-7269
dc.contributor.orcidimecPiao, Xiaoyu::0000-0002-2204-9636
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecImpagnatiello, Andrea::0000-0002-0923-4642
dc.contributor.orcidimecShimura, Yosuke::0000-0002-1944-9970
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMerckling, Clement::0000-0003-3084-2543
dc.contributor.orcidimecRosseel, Erik::0000-0002-2737-8391
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.date.accessioned2024-09-19T09:10:03Z
dc.date.available2024-02-16T17:38:06Z
dc.date.available2024-09-19T09:10:03Z
dc.date.embargo9999-12-31
dc.date.issued2024
dc.description.wosFundingTextWe would like to express sincere thanks to the imec core program members, the European Commission, local authorities, the imec pilot line and the imec material characterization and analysis group for their support. Additionally, we would like to thank the group of Prof. Christophe Detavernier from Ghent University for conducting the in situ XRD measurement. This project has received funding from the ECSEL Joint Undertaking (JU) under grant agreement No 101007254. The JU receives support from the European Union's Horizon 2020 research and innovation programme and Netherlands, Germany, France, Czech Republic, Austria, Spain, Belgium, Israel.
dc.identifier.doi10.35848/1347-4065/ad1f0d
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/43562
dc.publisherIOP Publishing Ltd
dc.source.beginpageArt. 02SP97
dc.source.endpageN/A
dc.source.issue2
dc.source.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.source.numberofpages8
dc.source.volume63
dc.subject.keywordsSI
dc.subject.keywordsSILICON
dc.subject.keywordsFILMS
dc.title

Crystallinity and composition of Sc1-x(-y)SixP(y) silicides in annealed TiN/Sc/Si:P stacks for advanced contact applications

dc.typeJournal article
dspace.entity.typePublication
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