Publication:
Widely tunable work function TaN/Ru stacking layer on HfLaO gate dielectric
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1955 since deposited on 2021-10-17
2last month
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Acq. date: 2026-01-11
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1955 since deposited on 2021-10-17
2last month
1last week
Acq. date: 2026-01-11
Citations