Publication:

Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology

Date

2009

Proceedings Paper

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Files

18888.pdf 458 KB

Author(s)

Ortolland, Claude

;

;

Horiguchi, Naoto

;

Kerner, Christoph

;

;

;

Verleysen, Eveline

;

;

Vandervorst, Wilfried

;

;

Absil, Philippe

;

Biesemans, Serge

;

Mathukrishnan, S.

;

;

;

Schreutelkamp, Rob

;

Hoffmann, Thomas Y.

Statistics

1 since deposited on 2021-10-18

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1849 since deposited on 2021-10-18

Acq. date: 2026-01-26