Role of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnects

dc.contributor.author	Wu, Chen
dc.contributor.author	Vaisman Chasin, Adrian
dc.contributor.author	Padovani, Andrea
dc.contributor.author	Lesniewska, Alicja
dc.contributor.author	Demuynck, Steven
dc.contributor.author	Croes, Kristof
dc.contributor.imecauthor	Wu, Chen
dc.contributor.imecauthor	Vaisman Chasin, Adrian
dc.contributor.imecauthor	Lesniewska, Alicja
dc.contributor.imecauthor	Demuynck, Steven
dc.contributor.imecauthor	Croes, Kristof
dc.contributor.orcidimec	Wu, Chen::0000-0002-4636-8842
dc.contributor.orcidimec	Vaisman Chasin, Adrian::0000-0002-9940-0260
dc.contributor.orcidimec	Lesniewska, Alicja::0000-0003-3863-065X
dc.contributor.orcidimec	Croes, Kristof::0000-0002-3955-0638
dc.date.accessioned	2021-10-27T23:38:56Z
dc.date.available	2021-10-27T23:38:56Z
dc.date.embargo	9999-12-31
dc.date.issued	2019
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/34453
dc.identifier.url	https://ieeexplore.ieee.org/document/8720534
dc.source.beginpage	1
dc.source.conference	IEEE International Reliability Physics Symposium - IRPS
dc.source.conferencedate	31/03/2019
dc.source.conferencelocation	Monterey, CA USA
dc.source.endpage	6
dc.title	Role of defects in the reliability of HfO2/Si-based spacer dielectric stacks for local interconnects
dc.type	Proceedings paper
dspace.entity.type	Publication
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