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Impact of the starting surface on the film characteristics of thermal Ru ALD for metal-insulator-metal applications
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Impact of the starting surface on the film characteristics of thermal Ru ALD for metal-insulator-metal applications
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Date
2014
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Popovici, Mihaela Ioana
;
Delabie, Annelies
;
Adelmann, Christoph
;
Marcoen, Kristof
;
Groven, Benjamin
;
Swerts, Johan
;
Meersschaut, Johan
;
Franquet, Alexis
;
Redolfi, Augusto
;
Jurczak, Gosia
;
Van Elshocht, Sven
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1840
since deposited on 2021-10-22
Acq. date: 2025-12-10
Citations
Metrics
Views
1840
since deposited on 2021-10-22
Acq. date: 2025-12-10
Citations