Publication:

Impact of the starting surface on the film characteristics of thermal Ru ALD for metal-insulator-metal applications

Date

2014
Proceedings Paper
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dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorDelabie, Annelies
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorMarcoen, Kristof
dc.contributor.authorGroven, Benjamin
dc.contributor.authorSwerts, Johan
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorRedolfi, Augusto
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorMarcoen, Kristof
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-22T04:49:17Z
dc.date.available2021-10-22T04:49:17Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/24395
dc.identifier.urlhttp://www.ald2014.org/pdf/ALD2014Program_V4.pdf
dc.source.beginpage105
dc.source.conferenceAVS Topical Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/06/2014
dc.source.conferencelocationKyoto Japan
dc.title

Impact of the starting surface on the film characteristics of thermal Ru ALD for metal-insulator-metal applications

dc.typeProceedings paper
dspace.entity.typePublication
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