Publication:
High-performance (EOT<0.4nm, Jg~10-7A/cm2) ALD-deposited Ru\SrTiO3 stack for next generations DRAM pillar capacitor
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2169 since deposited on 2021-10-26
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Acq. date: 2026-02-24
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Statistics
Views
2169 since deposited on 2021-10-26
2last month
2last week
Acq. date: 2026-02-24
Citations