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Articles
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Publication:
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
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Date
2009
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20291.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kempsell, Monica
;
Hendrickx, Eric
;
Tritchkov, Alexander
;
Sakajiri, Kyohei
;
Yasui, Kenichi
;
Yoshitake, Susuki
;
Granik, Yuri
;
Vandenberghe, Geert
;
Smith, Bruce W.
Journal
Journal of Micro/Nanolithography, MEMS, and MOEMS
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1934
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations
Metrics
Views
1934
since deposited on 2021-10-17
Acq. date: 2025-12-12
Citations