Publication:

Evolution of lithography-to-etch bias in multi-patterning processes

Date

2022
Journal article
https://doi.org/10.1116/6.0002059
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

Published version 8.62 MB

Author(s)

Panneerchelvam, Prem
;
Agarwal, Ankur
;
Huard, Chad M. M.
;
Pret, Alessandro Vaglio
;
Mani, Antonio
;
Gronheid, Roel
;
Demand, Marc
;
Kumar, Kaushik
;
Paolillo, Sara  
;
Lazzarino, Frederic  

Journal

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Abstract

Description

Metrics

Downloads

22 since deposited on 2022-10-09
Acq. date: 2025-10-25

Views

1596 since deposited on 2022-10-09
Acq. date: 2025-10-25

Citations

Metrics

Downloads

22 since deposited on 2022-10-09
Acq. date: 2025-10-25

Views

1596 since deposited on 2022-10-09
Acq. date: 2025-10-25

Citations