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Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
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Top-surface imaging and optical proximity correction: a way to 0.18 µm lithography at 248 nm
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Date
1996
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Vertommen, Johan
;
Van Roey, Frieda
;
Yen, Anthony
;
Tritchkov, Alexander
;
Ronse, Kurt
;
Jonckheere, Rik
;
Van den hove, Luc
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1927
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Acq. date: 2025-12-12
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Views
1927
since deposited on 2021-09-29
1
last month
Acq. date: 2025-12-12
Citations