Publication:

Investigation of mask defect density in full field EUV lithography

Date

2009

Proceedings Paper

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Files

18873.pdf 2.56 MB

Author(s)

Jonckheere, Rik

;

Van Den Heuvel, Dieter

;

Lamantia, Matthew

;

;

Hendrickx, Eric

;

Goethals, Mieke

;

Vandenberghe, Geert

;

Statistics

1939 since deposited on 2021-10-17

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Acq. date: 2026-03-01