Publication:

Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study

Date

2003
Journal article
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dc.contributor.authorGrill, A.
dc.contributor.authorPatel, V.
dc.contributor.authorRodbell, K.P.
dc.contributor.authorHuang, E.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMoguilnikov, Konstantin
dc.contributor.authorToney, M.
dc.contributor.authorKim, H.C.
dc.date.accessioned2021-10-15T04:50:40Z
dc.date.available2021-10-15T04:50:40Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7629
dc.source.beginpage3427
dc.source.endpage3435
dc.source.issue5
dc.source.journalJournal of Applied Physics
dc.source.volume94
dc.title

Porosity in plasma enhanced chemical vapor deposited SiCOH dielectrics: a comparative study

dc.typeJournal article
dspace.entity.typePublication
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