Publication:

Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

Date

2012
Journal article
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Author(s)

Swerts, Johan  
;
Armini, Silvia  
;
Carbonell, Laure
;
Delabie, Annelies  
;
Franquet, Alexis  
;
Mertens, Sofie  
;
Popovici, Mihaela Ioana  
;
Schaekers, Marc  
;
Witters, Thomas  
;
Tokei, Zsolt  
;
Beyer, Gerald  
;
Van Elshocht, Sven  
;
Gravey, Virginie
;
Cockburn, Andrew  
;
Shah, Kavita
;
Aubuchon, Joseph

Journal

Journal of Vacuum Science and Technology A

Abstract

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