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Interfacial Properties of nMOSFETs With Different Al2O3 Capping Layer Thickness and TiN Gate Stacks
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Authors
Wang, Danghui
;
Xu, Tianhan
;
Simoen, Eddy
;
Govoreanu, Bogdan
;
Claeys, Cor
;
Zhang, Yang
DOI
10.1109/TED.2020.3047356
ISSN
0018-9383
Issue
3
Journal
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume
68
Title
Interfacial Properties of nMOSFETs With Different Al2O3 Capping Layer Thickness and TiN Gate Stacks
Publication type
Journal article
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2
20.500.12860/38102.2
*
2022-06-16T09:25:51Z
validation by library/open access desk
1
20.500.12860/38102
2021-11-02T16:04:00Z
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