Publication:

Investigation of device transport characteristics enhancement of In0.53Ga0.47As MOSFET through in situ NH3/N-2 remote-plasma treatment

Date

2021
Journal article
https://doi.org/10.1063/5.0037378
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Author(s)

Huang, P.
;
Luc, Q. H.
;
Chang, E. Y.
;
Sibaja-Hernandez, Arturo  
;
Hsu, C. W.
;
Wu, J. Y.
;
Ko, H. L.
;
Tran, N. A.
;
Collaert, Nadine  

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AIP ADVANCES

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289 since deposited on 2021-11-02
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