Publication:
Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
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342 since deposited on 2021-12-06
60last month
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2090 since deposited on 2021-12-06
2last month
Acq. date: 2026-01-11
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