Publication:
Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)
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521 since deposited on 2024-06-06
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Acq. date: 2026-08-25
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Statistics
Views
521 since deposited on 2024-06-06
9last month
3last week
Acq. date: 2026-08-25
Citations