Publication:
Dry Etch Challenges for Patterning Middle-of-line (MOL) Contact Trench in Monolithic CFET (complementary FET)
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501 since deposited on 2024-06-06
1last month
Acq. date: 2026-01-11
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Views
501 since deposited on 2024-06-06
1last month
Acq. date: 2026-01-11
Citations