Browsing Articles by author "O'Connor, Robert"
Now showing items 1-12 of 12
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Anomalous positive-bias temperature instability of high-k/metal gate devices with Dy2O3 capping
O'Connor, Robert; Chang, Vincent; Pantisano, Luigi; Ragnarsson, Lars-Ake; Aoulaiche, Marc; O'Sullivan, Barry; Groeseneken, Guido (2008) -
Area-Selective Deposition of AlOx and Al-Silicate for Fully Self- Aligned Via Integration
Pasquali, Mattia; Brady-Boyd, Anita; Lesniewska, Alicja; Carolan, Patrick; Conard, Thierry; O'Connor, Robert; De Gendt, Stefan; Armini, Silvia (2023) -
Charge trapping in MOSFETs with HfSiON dielectrics during electrical stressing
O'Connor, Robert; Hughes, Greg; Degraeve, Robin; Kaczer, Ben (2005) -
Electron energy dependence of defect generation in high-k gate stacks
O'Connor, Robert; Pantisano, Luigi; Degraeve, Robin; Kauerauf, Thomas; Kaczer, Ben; Roussel, Philippe; Groeseneken, Guido (2008) -
Low voltage stress-induced leakage current in 1.4 - 2.1 nm SiON and HfSiON gate dielectric layers
O'Connor, Robert; McDonnell, Stephen; Hughes, Greg; Degraeve, Robin; Kauerauf, Thomas (2005-08) -
Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayers
Bogan, Justin; Brady-Boyd, Anita; Armini, Silvia; Lundy, R.; Selvaraju, V.; O'Connor, Robert (2018) -
On the use of (3-trimethoxysilylpropyl)diethylenetriamine self-assembled monolayers as seed layers for the growth of Mn based copper diffusion barrier layers
Bodgan, Justin; Brady-Boyd, Anita; O'Connor, Robert; Armini, Silvia; Selvaraju, Venkateswaran; Hughes, Greg (2018) -
Reliability of HfSiON gate dielectrics
O'Connor, Robert; Hughes, Greg; Degraeve, Robin; Kaczer, Ben; Kauerauf, Thomas (2005) -
Reliability of thin ZrO2 gate dielectric layers
O'Connor, Robert; Hughes, Greg; Kauerauf, Thomas; Ragnarsson, Lars-Ake (2011) -
Stress induced defect generation implications of doping HfO2 with Al
O'Connor, Robert; Kauerauf, Thomas; Arimura, Hiroaki; Ragnarsson, Lars-Ake (2013) -
Temperature-accelerated breakdown in ultra-thin SiON dielectrics
O'Connor, Robert; Hughes, Greg; Degraeve, Robin; Kaczer, Ben (2004) -
Time dependent dielectric breakdown and stress induced leakage current characteristics of 0.7nm EOT HfO2 pFETs
O'Connor, Robert; Hughes, Greg; Kauerauf, Thomas (2011)