Browsing Articles by imec author "f11ee768cfebb41cbbac5ff11a4b8b811c5474e4"
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30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2009) -
Dielectric reliability of 70 nm pitch air-gap interconnect structures
Pantouvaki, Marianna; Sebaai, Farid; Kellens, Kristof; Goossens, Danny; Vereecke, Bart; Versluijs, Janko; Van Besien, Els; Caluwaerts, Rudy; Marrant, Koen; Bender, Hugo; Moussa, Alain; Struyf, Herbert; Beyer, Gerald (2011) -
Fabrication and characterization of CMOS-compatible integrated tungsten heaters for thermo-optic tuning in silicon photonics devices
Masood, A.; Pantouvaki, Marianna; Goossens, Danny; Lepage, Guy; Verheyen, Peter; Van Campenhout, Joris; Absil, Philippe; Van Thourhout, Dries; Bogaerts, Wim (2014-07) -
Impact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications
Collaert, Nadine; Mannaert, Geert; Paraschiv, Vasile; Goossens, Danny; Demand, Marc; Eberle, Wolfgang (2012-11) -
Patterning of 25nm contact holes at 90nm pitch: combination of line/space double exposure immersion lithography and plasma-assisted shrink technology
de Marneffe, Jean-Francois; Lazzarino, Frederic; Goossens, Danny; Vandervorst, Alain; Richard, Olivier; Shamiryan, Denis; Xu, Kaidong; Truffert, Vincent; Boullart, Werner (2011)