Browsing Presentations by imec author "1d926090eefb4fa2cb30c04228151f5edaac7914"
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28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Chan, BT; Tahara, Shigeru; Parnell, Doni; Rincon Delgadillo, Paulina; Gronheid, Roel; de Marneffe, Jean-Francois; Xu, Kaidong; Nishimura, Eiichi; Werner, Thilo (2013) -
2D and 3D photoresist line roughness characterization
Vaglio Pret, Alessandro; Gronheid, Roel; Kunnen, Eddy; Pargon, Erwine; Luere, Olivier; Bianchi, Davide (2012) -
Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
Characterization of directed self-assembly process using grazing incidence small angle X-ray scattering
Suh, Hyo-Seon; Rincon Delgadillo, Paulina; Chen, Xuenxuen; Wan, Lingshu; Jiang, Zhang; Strzalka, Joseph; Wang, Jin; Chen, Wei; Gronheid, Roel; Nealey, Paul (2014) -
Characterization of extreme ultraviolet resists with interference lithography
Solak, Harun H.; Ekinci, Yasin; Gronheid, Roel; Jouve, Amandine (2005) -
Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Kuppuswamy, Vijaya Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2011) -
Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers
Gronheid, Roel; Singh, Arjun; Chan, BT; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd; Romo Negreira, Ainhoa; Somervell, Mark; Tahara, Shigeru; Nafus, Kathleen (2012) -
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Bekaert, Joost; Gronheid, Roel; MKuppuswamy, Vijaya Kumar; Doise, Jan; Chan, BT; Vandenberghe, Geert; Sayan, Safak; Cao, Yi; Her, YoungJun (2014) -
Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
Bekaert, Joost; Doise, Jan; MKuppuswamy, Vijaya Kumar; Chan, BT; Gronheid, Roel; Vandenberghe, Geert; Cao, Yi; Her, YoungJun (2014) -
Defect characterization in templated DSA through electrical measurements
Rincon Delgadillo, Paulina; Chan, BT; Gronheid, Roel; van der Veen, Marleen; Heylen, Nancy; Vandersmissen, Kevin; Demuynck, Steven; Boemmels, Juergen (2016) -
Design method for the integration of DSA via patterning in sub-7 nm circuits
Karageorgos, Ioannis; Ryckaert, Julien; Croes, Kris; Tung, C. Maryann; Wong, H. -S. Philip; Karageorgos, Evangelos; Gronheid, Roel; Bekaert, Joost; Vandenberghe, Geert; Stucchi, Michele; Dehaene, Wim (2016) -
Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication
Rincon Delgadillo, Paulina; Gronheid, Roel; Thode, Christopher; Wu, Hengpeng; Cao, Yi; Lin, Guanyang; Somervell, Mark; Nafus, Kathleen; Nealey, Paul (2012) -
Determination of critical parameters for control of directed self-assembly of block copolymers using frequency multiplication
Rincon Delgadillo, Paulina; Nealey, Paul; Gronheid, Roel; Nafus, Kathleen; Somervell, Mark; Cao, Yi; Lin, Guanyang (2012) -
Directed self-assembly of silicon-containing block copolymers for 20nm lithography
Blachut, Gregory; Sirard, Stephen; Maher, Michael; Asano, Yusuke; Someya, Yasunobu; Lane, Austin; Durand, William; Gronheid, Roel; Hymes, Diane; Ellison, Christopher; Willson, Grant (2016) -
Directed self-assembly of silicon-containing block copolymers with a hybrid chemo-/grapho-epitaxial flow
Blachut, Gregory; Sirard, Stephen; Maher, Michael; Asano, Yusuke; Someya, Yasunobu; Lane, Austin; Durand, William; Gronheid, Roel; Hymes, Diane; Ellison, Christopher; Willson, Grant (2016) -
Double patterning process development at IMEC
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Gronheid, Roel; Versluijs, Janko; Miller, Andy (2008) -
DSA patterning scaling through lithography and etch process integration
Rathsack, Ben; Gronheid, Roel (2012) -
DSA preparing for fab introduction
Gronheid, Roel (2011) -
EUV lithography development progress in IMEC
Vandenberghe, Geert; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Gronheid, Roel; Ronse, Kurt (2009) -
EUV lithography: recent achievements of a maturing technology
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2010)