Browsing Presentations by imec author "26f1ddf8cd36f4998fbfcfbd5c17429fa70615d8"
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3D FinFET gate etch for advanced CMOS scaling
Dupuy, Emmanuel; Altamirano Sanchez, Efrain; Marinov, Daniil; Hody, Hubert; Mertens, Hans; Siew, Yong Kong; Demuynck, Steven; Horiguchi, Naoto (2019) -
CMOS technology development vehicle for bulk FinFET N10/N7
Dehan, Morin; Boemmels, Juergen; Horiguchi, Naoto; Van der Plas, Geert (2013) -
Development of a DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Zhao, Chao; Demuynck, Steven; Tokei, Zsolt; Horiguchi, Naoto; Ahn, J.Y. (2008) -
Gate-First High-k/Metal Gate FinFET for advanced DRAM peripheral transistors
Dupuy, Emmanuel; Capogreco, Elena; Dentoni Litta, Eugenio; Tao, Zheng; Sebaai, Farid; Spessot, Alessio; Horiguchi, Naoto (2022-09-20) -
New lithographic requirements for the implant levels in scaled devices
Vandeweyer, Tom; Baerts, Christina; Horiguchi, Naoto; Ercken, Monique (2010) -
SEM Inspection of Nanowire Devices: Contact inspection, Resistance and Capacitance Measurement and Buckling Evaluation
Ohashi, Takeyoshi; Hasumi, Kazuhisa; Masami, Ikota; Lorusso, Gian; Mertens, Hans; Witters, Liesbeth; Horiguchi, Naoto (2019)