Browsing Presentations by imec author "c74e0e4def2465f64d977a6aa11ecdf1d4287b2c"
Now showing items 1-14 of 14
-
15nm half-pitch patterning: EUV + SELF-aligned double patterning
Versluijs, Janko; Souriau, Laurent; Hellin, David; Orain, Isabelle; Kimura, Yoshie; Kunnen, Eddy; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Wiaux, Vincent; Xu, Kaidong (2012) -
Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Chromeless phase lithography for contact hole imaging
Vandenberghe, Geert; Hendrickx, Eric; Wiaux, Vincent (2004) -
Critical pattern behavior at nanometer scale vicinity of black border
Kovalevich, Tatiana; Bekaert, Joost; Wiaux, Vincent; Liddle, Jack; Davydova, Natalia; Tien, Ming-Chun (2019) -
Double litho, double etch (LELE) process challenges for 22nm HP and beyond
Maenhoudt, Mireille; Wiaux, Vincent; Cheng, Shaunee; Vandenberghe, Geert; Ronse, Kurt (2008) -
Double patterning: from split to process control
Wiaux, Vincent; Ercken, Monique; Maenhoudt, Mireille; Cheng, Shaunee (2007) -
EDA perspective on manufacturable DPT solutions
Wiaux, Vincent; Gao, Weimin; Lucas, Kevin; Cork, Chris; Luk-Pat, Gerry; Miloslavsky, Alex; Barnes, L.; Painter, B.; Li, X. (2010) -
Extreme scaling of optical lithography: overview of process integration issues
Ronse, Kurt; Wiaux, Vincent; Verhaegen, Staf; Van Look, Lieve; Bekaert, Joost; Laidler, David; Cheng, Shaunee; Maenhoudt, Mireille; Vandenberghe, Geert; Dusa, Mircea (2009) -
IMEC lithography activities for 45nm node and beyond: mask impact
Philipsen, Vicky; De Bisschop, Peter; Hendrickx, Eric; Wiaux, Vincent; Vandenberghe, Geert; Jonckheere, Rik (2007) -
Making lots of little holes (or using CMOS mass fabrication technology to make photonic crystals)
Bogaerts, Wim; Wiaux, Vincent; Taillaert, Dirk; Beckx, Stephan; Baets, Roel (2002) -
Meeting double patterning challenges: from split to process control
Wiaux, Vincent; Cheng, Shaunee; Maenhoudt, Mireille; Storms, Greet; Vandenberghe, Geert; Verhaegen, Staf (2007) -
Multiple patterning: a path towards sub-20nm hp
Vandenberghe, Geert; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Wiaux, Vincent (2010) -
Nanophotonic waveguides in silicon-on-insulator fabricated with CMOS technology
Bogaerts, Wim; Dumon, Pieter; Wiaux, Vincent; Wouters, Jan; Beckx, Stephan; Taillaert, Dirk; Luyssaert, Bert; Van Campenhout, Jan; Van Thourhout, Dries; Baets, Roel (2003)