Browsing by Author "Asenov, A."
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Publication Development of a technique for characterizing bias temperature unstability-induced device-to-device variation at SRAM-relevant conditions
Journal article2014, IEEE Transactions on Electron Devices, (61) 9, p.3081-3089Publication Hot carrier aging and its variation under use-bias: kinetics, prediction, impact on Vdd and SRAM
;Duan, M. ;Zhang, J. F. ;Manut, A. ;Ji, Z. ;Zhang, W. ;Asenov, A. ;Gerrer, L. ;Reid, D.Razaidi, H.Proceedings paper2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.547-550Publication Impact of single charged gate oxide defects on the performance and scaling of nanoscaled FETs
Proceedings paper2012, International Reliability Physics Symposium - IRPS, 15/04/2012, p.5A-4Publication Interaction between hot carrier aging and PBTI degradation in nMOSFETs: characterization, modelling and lifetime prediction
;Meng, D. ;Zhang, J. F. ;Zhang, J. C. ;Zhang, W. ;Ji, Z. ;Benbakhti, B. ;Zheng, X. F. ;Hao, Y.Vigar, D.Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-5.1-XT-5.7Publication Key issues and techniques for characterizing time-dependent device-to-device variation of SRAM
;Duan, M. ;Zhang, J. F. ;Ji, Z. ;Ma, J. G. ;Zhang, W.; ; Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.774-777Publication Monte Carlo simulation study of hole mobility in germanium MOS inversion layers
Proceedings paper2010, 14th International Workshop on Computational Electronics- IWCE, 26/10/2010, p.4 pp.Publication On the distribution of the FET threshold voltage shifts due to individual charged gate oxide defects
Proceedings paper2016, International Integrated Reliability Workshop - IIRW, 9/10/2016Publication TEM analysis of Ge-on-Si MOSFET structures with HfO2 dielectric for high performance PMOS device technology
;Norris, D.J. ;Walther, T. ;Cullis, A.G. ;Myronov, M. ;Dobbie, A. ;Whall, T.Parker, E.H.C.Journal article2010, Journal of Physics Conference Series, (209) 1, p.12061Publication Time-dependent variation: A new defect-based prediction methodology
;Duan, M. ;Zhang, J. F. ;Ji, Z. ;Zhang, W.; ; ; Proceedings paper2014, IEEE VLSI Technology Symposium, 9/06/2014, p.1-2