Browsing by Author "Bajolet, Philippe"
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Publication ALD HfO2 surface preparation study
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.179-184Publication Atomic layer deposition and remote plasma surface preparation for gate stack applications
Proceedings paper2003, Proceedings AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.12-15Publication Gate stack preparation with high-k materials in a cluster tool
Proceedings paper2001, Proceedings of the IEEE International Symposium on Semiconductor Manufacturing - ISSM, 8/10/2001, p.395-398Publication Maximization of active As doping (selective) epitaxial Si and SiGe layers
Proceedings paper2004-10, SiGe: Materials, Processing, and Devices. Proceedings of the 1st International Symposium, 3/10/2004, p.1123-1133Publication Scaling of high-k dielectrics towards sub-1nm EOT
Proceedings paper2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254Publication Thermal stability and scalability of zr-aluminate-based high-k gate stacks