Browsing by Author "Bellandi, E."

Now showing 1 - 4 of 4

Characterization of high-k dielectrics by combined spectroscopic ellipsometry (SE) and x-ray reflectometry (XRR)

Sun, L.
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Defranoux, C.
;
Stehlé, J.L.
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Boher, P.
;
Evrard, P.
;
Bellandi, E.
;
Bender, Hugo
Proceedings paper
2004, Fundamentals of Novel Oxide/Semiconductor Interfaces, 1/12/2003, p.95-101
Comparison of RCA and IMEC clean (HF last) type cleaning sequences in full production environment

Wolke, K.
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Schenkl, M.
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Silvestre, P.
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Bellandi, E.
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Alessandri, M.
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Cornelissen, Ingrid
Proceedings paper
1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.199-203
High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry

Boher, P.
;
Evrard, P.
;
Defranoux, C.
;
Darragon, A.
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Sun, Lianchao
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Fouere, J.C.
;
Stehlé, J.L.
Proceedings paper
2003-12, MRS Fall Meeting Symposium E: Fundamentals of Novel Oxide/Semiconductor Interfaces, 1/12/2003
High-k dielectric characterization by VUV spectroscopic ellipsometry and X-ray reflection

Boher, P.
;
Evrard, P.
;
Defranoux, C.
;
Fouere, J.C.
;
Bellandi, E.
;
Bender, Hugo
Proceedings paper
2003, Characterization and Metrology of ULSI Technology, 24/03/2003, p.148-153