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Browsing by Author "Bennett, J."

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    Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures

    Young, C.D.
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    Kerber, Andreas
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    Hou, T.H.
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    Cartier, Eduard
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    Brown, G.A.
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    Bersuker, G.
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    Kim, Y.
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    Lim, C.
    Proceedings paper
    2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.347-359
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    Charge trapping and mobility degradation in MOCVD hafnium silicate gate dielectric stack structures

    Young, C.D.
    ;
    Kerber, Andreas
    ;
    Hou, T.H.
    ;
    Cartier, E.
    ;
    Brown, G.A.
    ;
    Bersuker, G.
    ;
    Kim, Y.
    ;
    Lim, C.
    Meeting abstract
    2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 12/10/2003
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    On the reliability of SIMS depth profiles through HfO2-stacks

    Vandervorst, Wilfried  
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    Bennett, J.
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    Huyghebaert, Cedric  
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    Conard, Thierry  
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    Gondran, C.
    Journal article
    2004, Applied Surface Science, 231-232, p.569-573
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    Progress towards an electrically active, ultra-shallow junction depth reference for carrier illumination, SRP and SIMS

    Borden, P.
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    Bechtler, L.
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    Klemme, B.
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    Nijmeijer, R.
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    Judge, E.
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    Diebold, A.
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    Bennett, J.
    Proceedings paper
    2001, 6th Int. Workshop on Fabrication, Characterization and Modeling of Ultra-Shallow Doping Profiles in Semiconductors - USJ, 22/04/2001, p.161-167
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    Sputter rate variations in silicon under high-k dielectric films

    Bennett, J.
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    Beebe, M.
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    Sparks, C.
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    Gondran, C.
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    Vandervorst, Wilfried  
    Journal article
    2004, Applied Surface Science, 231-232, p.565-568
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    Sputter rate variations in silicon under high-k dielectric films

    Bennett, J.
    ;
    Beebe, M.
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    Sparks, C.
    ;
    Gondran, C.
    ;
    Vandervorst, Wilfried  
    Proceedings paper
    2004-05, Proceedings of the Fourteenth Int. Conference on Secondary Ion Mass Spectrometry and Related Topics, 14/09/2003, p.565-568

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