Browsing by Author "Biafore, John"
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Publication A compact physical CD-SEM simulator for IC photolithography modeling applications
Proceedings paper2014, Scanning Microscopies 2014, 16/09/2014, p.923618Publication Characterization of a thermal freeze LLE double patterning process for predictive simulation
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Impact of mask line roughness in EUV lithography
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.79691TPublication Impact of mask three dimensional effects on resist-model calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters), (8) 3, p.30501Publication Impact of stochastic effects on EUV printability limits
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.904809Publication Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Proceedings paper2011, International Symposium on Lithography Extensions - EUVL, 20/10/2011Publication Litho 1-litho 2 proximity differences for s LELE and LPLE double patterning processes
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83260EPublication Mask absorber roughness impact in extreme ultraviolet lithography
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 2, p.23012Publication Mask effects on resist variability in extreme ultraviolet lithography
Journal article2013, Japanese Journal of Applied Physics, (52) 6, p.03GC02Publication Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86792OPublication Statistical simulation of resist at EUV and ArF
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727319Publication Stochastic and systematic patterning failure mechanisms for contact-holes in EUV lithography: part 2
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.904834Publication Stochastic effects and resist variability in high resolution lithography
Oral presentation2012, 25th International Microprocesses and Nanotechnology Conference - MNCPublication Stochastic limitations for EUV resist kinetics towards the 16nm node
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011