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Browsing by Author "Chen, Michael"

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    Designing the ideal transition-metal-oxide-based RRAM stack from first-principles thermodynamics and defect kinetics

    Clima, Sergiu  
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    Chen, Yangyin  
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    Fantini, Andrea  
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    Chen, Michael
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    Goux, Ludovic  
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    Govoreanu, Bogdan  
    Meeting abstract
    2015, MRS Spring Meeting Symposium AA: Materials for Beyond the Roadmap Devices in Logic, Power and Memory, 6/04/2015
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    Doped Gd-O based RRAM for embedded application

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Redolfi, Augusto  
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    Groeseneken, Guido  
    Proceedings paper
    2016, International Memory Workshop - IMW, 15/05/2016, p.60-63
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    Endurance failure mechanisms in TiN\Ta2O5\Ta RRAM stack

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Clima, Sergiu  
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    Degraeve, Robin  
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    Redolfi, Augusto  
    Journal article
    2015, Applied Physics Letters, (106) 5, p.53501
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    Engineering of a TiN\Al2O3(Hf,Al)O2\Ta2O5\Hf RRAM cell for fast operation at low current

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Degraeve, Robin  
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    Redolfi, Augusto  
    Proceedings paper
    2015, 45th European Solid State Devices and Research Conference - ESSDERC, 14/09/2015, p.262-265
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    First-principles thermodynamics and defect kinetics guidelines for engineering a tailored RRAM device

    Clima, Sergiu  
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    Chen, Yangyin  
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    Chen, Michael
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    Goux, Ludovic  
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    Govoreanu, Bogdan  
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    Degraeve, Robin  
    Journal article
    2016, Journal of Applied Physics, (119) 22, p.225107
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    Impact of tungsten oxidation conditions on the performance of Al2O3/WOx-based CBRAM devices

    Chen, Zhe
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    Belmonte, Attilio  
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    Chen, Michael
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    Radhakrishnan, Janaki  
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    Redolfi, Augusto  
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    Kang, J.
    Journal article
    2017, Microelectronic Engineering, 178, p.56-59
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    Intrinsic program instability in HfO2 RRAM and consequences on program algorithms

    Fantini, Andrea  
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    Gorine, Georgi
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    Degraeve, Robin  
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    Goux, Ludovic  
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    Chen, Michael
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    Redolfi, Augusto  
    Proceedings paper
    2015, International Electron Devices Meeting - IEDM, 7/12/2015, p.169-172
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    Low-current operation of novel Gd2O3-based RRAM cells with large memory window

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Redolfi, Augusto  
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    Groeseneken, Guido  
    Journal article
    2016-09, Physica Status Solidi A, (213) 2, p.320-324
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    Low-current operation of novel TiN\Gd-Al-O\Hf RRAM cells with large memory window

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Redolfi, Augusto  
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    Groeseneken, Guido  
    Oral presentation
    2015, E-MRS Spring Meeting Symposium AA: Non-Volatile Memories: Materials, Nanostructures and Integration Approaches
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    Novel flexible and cost-effective retention assessment method for TMO-based RRAM

    Chen, Michael
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    Fantini, Andrea  
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    Goux, Ludovic  
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    Gorine, Georgi
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    Redolfi, Augusto  
    Journal article
    2016, IEEE Electron Device Letters, (37) 9, p.1112-1115
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    Oxygen chemical potential optimization for low current (<10μA) resistive switching in oxide-based RRAM

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Redolfi, Augusto  
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    Groeseneken, Guido  
    Proceedings paper
    2016, International Symposium on VLSI Technology, Systems and Application - VLSI-TSA, 25/04/2016, p.T2-2
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    Programming-conditions solutions towards suppression of retention tails of scaled oxide-based RRAM

    Chen, Michael
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    Fantini, Andrea  
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    Goux, Ludovic  
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    Degraeve, Robin  
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    Clima, Sergiu  
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    Redolfi, Augusto  
    Proceedings paper
    2015-12, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.261-264
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    Quantitative model for post-program instabilities in filamentary RRAM

    Degraeve, Robin  
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    Fantini, Andrea  
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    Gorine, G.
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    Roussel, Philippe  
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    Clima, Sergiu  
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    Chen, Michael
    Proceedings paper
    2016, IEEE Reliability Physics Symposium - IRPS, 17/04/2016, p.6C.1
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    Quantitative retention model for filamentary oxide-based resistive RAM

    Degraeve, Robin  
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    Chen, Michael
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    Celano, Umberto  
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    Fantini, Andrea  
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    Goux, Ludovic  
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    Linten, Dimitri  
    Journal article
    2017, Microelectronic Engineering, 178, p.38-41
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    Quantitive endurance failure model for filamentary RRAM

    Degraeve, Robin  
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    Fantini, Andrea  
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    Roussel, Philippe  
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    Goux, Ludovic  
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    Costantino, A.
    Proceedings paper
    2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.188-189
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    Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM

    Goux, Ludovic  
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    Belmonte, Attilio  
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    Celano, Umberto  
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    Woo, Jiyong
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    Folkersma, Steven  
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    Chen, Michael
    Proceedings paper
    2016, IEEE Symposium on VLSI Technology, 16/05/2016, p.1-2
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    Role of the Ta scavenger electrode in the excellent switching control and reliability of a scalable low-current operated TiN\Ta2O5\Ta RRAM device

    Goux, Ludovic  
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    Fantini, Andrea  
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    Redolfi, Augusto  
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    Chen, Michael
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    Shi, FangFang
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    Degraeve, Robin  
    Proceedings paper
    2014, Symposium on VLSI technology, 9/06/2014, p.162-163
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    RRAM overview

    Chen, Michael
    Oral presentation
    2015, Talk in Macronix Taiwan
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    Stack optimization of oxide-based RRAM for fast write speed (<1 $ls) at low operating current (<10 $lA)

    Chen, Michael
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    Goux, Ludovic  
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    Fantini, Andrea  
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    Degraeve, Robin  
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    Redolfi, Augusto  
    Journal article
    2016, Solid-State Electronics, 125, p.198-203
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    Statistical investigation of the impact of program history and oxide-metal interface on OxRRAM retention

    Chen, Michael
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    Fantini, Andrea  
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    Degraeve, Robin  
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    Redolfi, Augusto  
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    Groeseneken, Guido  
    Proceedings paper
    2016, IEEE International Electron Devices Meeting - IEEE IEDM, 5/12/2016, p.99-102
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