Browsing by Author "Chen, Michael"
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Publication Designing the ideal transition-metal-oxide-based RRAM stack from first-principles thermodynamics and defect kinetics
Meeting abstract2015, MRS Spring Meeting Symposium AA: Materials for Beyond the Roadmap Devices in Logic, Power and Memory, 6/04/2015Publication Doped Gd-O based RRAM for embedded application
Proceedings paper2016, International Memory Workshop - IMW, 15/05/2016, p.60-63Publication Endurance failure mechanisms in TiN\Ta2O5\Ta RRAM stack
Journal article2015, Applied Physics Letters, (106) 5, p.53501Publication Engineering of a TiN\Al2O3(Hf,Al)O2\Ta2O5\Hf RRAM cell for fast operation at low current
Proceedings paper2015, 45th European Solid State Devices and Research Conference - ESSDERC, 14/09/2015, p.262-265Publication First-principles thermodynamics and defect kinetics guidelines for engineering a tailored RRAM device
Journal article2016, Journal of Applied Physics, (119) 22, p.225107Publication Impact of tungsten oxidation conditions on the performance of Al2O3/WOx-based CBRAM devices
Journal article2017, Microelectronic Engineering, 178, p.56-59Publication Intrinsic program instability in HfO2 RRAM and consequences on program algorithms
Proceedings paper2015, International Electron Devices Meeting - IEDM, 7/12/2015, p.169-172Publication Low-current operation of novel Gd2O3-based RRAM cells with large memory window
Journal article2016-09, Physica Status Solidi A, (213) 2, p.320-324Publication Low-current operation of novel TiN\Gd-Al-O\Hf RRAM cells with large memory window
Oral presentation2015, E-MRS Spring Meeting Symposium AA: Non-Volatile Memories: Materials, Nanostructures and Integration ApproachesPublication Novel flexible and cost-effective retention assessment method for TMO-based RRAM
Journal article2016, IEEE Electron Device Letters, (37) 9, p.1112-1115Publication Oxygen chemical potential optimization for low current (<10μA) resistive switching in oxide-based RRAM
Proceedings paper2016, International Symposium on VLSI Technology, Systems and Application - VLSI-TSA, 25/04/2016, p.T2-2Publication Programming-conditions solutions towards suppression of retention tails of scaled oxide-based RRAM
Proceedings paper2015-12, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.261-264Publication Quantitative model for post-program instabilities in filamentary RRAM
Proceedings paper2016, IEEE Reliability Physics Symposium - IRPS, 17/04/2016, p.6C.1Publication Quantitative retention model for filamentary oxide-based resistive RAM
; ;Chen, Michael; ; ; Journal article2017, Microelectronic Engineering, 178, p.38-41Publication Quantitive endurance failure model for filamentary RRAM
Proceedings paper2015, IEEE Symposium on VLSI Technology, 15/06/2015, p.188-189Publication Retention, disturb and variability improvements enabled by local chemical-potential tuning and controlled hour-glass filament shape in a novel W\WO3\Al2O3\Cu CBRAM
; ; ; ;Woo, Jiyong; Chen, MichaelProceedings paper2016, IEEE Symposium on VLSI Technology, 16/05/2016, p.1-2Publication Role of the Ta scavenger electrode in the excellent switching control and reliability of a scalable low-current operated TiN\Ta2O5\Ta RRAM device
Proceedings paper2014, Symposium on VLSI technology, 9/06/2014, p.162-163Publication Stack optimization of oxide-based RRAM for fast write speed (<1 $ls) at low operating current (<10 $lA)
Journal article2016, Solid-State Electronics, 125, p.198-203Publication Statistical investigation of the impact of program history and oxide-metal interface on OxRRAM retention
Proceedings paper2016, IEEE International Electron Devices Meeting - IEEE IEDM, 5/12/2016, p.99-102