Browsing by Author "Conley, Will"
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Publication Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node
Publication Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode
Publication Mighty hight-t lithography for 65nm generation contacts
Publication Process, design and optical proximity correction requirements for the 65nm device generation
Publication Progress in 157-nm resist performance and potential
Proceedings paper2002, Advances in Resist Technology and Processing XIX, 4/03/2002, p.512-521Publication Tunable bandwidth for application-specific SAxP process enhancement
Proceedings paper2018, Optical Microlithography XXXI, 25/02/2018, p.1058705