Browsing by Author "De Poortere, Etienne"
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Publication 28nm-pitch Ru interconnects patterned with 0.33NA-EUV single exposure
Proceedings paper2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021, p.32-41Publication E-TEST validation of EPE budget and metrology
Oral presentation2020, SPIE advanced lithography - Metrology, Inspection, and Process Control for Microlithography XXXIVPublication Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning
; ; ; ; ; Kissoon, NicolaProceedings paper2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570SPublication Large area EUV via yield analysis for single damascene process: voltage contrast, CD and defect metrology
Proceedings paper2019, International Conference on Extreme Ultraviolet Lithography 2019, 16/09/2019, p.11147OB