Browsing by Author "Delorme, Max"
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Publication Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Journal article2022-11-25, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 4, p.043202-1-043202-16Publication Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid
Proceedings paper2022-05-26, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510IPublication Mask Contribution to OPC Model Accuracy
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115171DPublication NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability
Proceedings paper2021-02-22, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021