Browsing by Author "Detavernier, C."
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Publication 0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632Publication A BEEM study of PtSi Schottky contacts on ion-milled Si
Publication A study on (Co1-xNixSi2) Schottky contacts on N-Si(100) substrates
Proceedings paper2001, Semiconductor Technology - ISTC, p.540-548Publication Alternative catalysts for si-technology compatible growth of si nanowires
Proceedings paper2007, Low-Dimensional Materials. Synthesis, Assembly, Property Scaling, and Modeling, 9/04/2007, p.DD01-10Publication Alternative catalysts for Si-technology compatible growth of Si nanowires
Proceedings paper2007, Applications of Nanotubes and Nanowires, 9/04/2007, p.EE01-10Publication Amorphous and perovskite Li3xLa(2/3)-xTiO3 (thin) films via chemical solution deposition: solid electrolytes for all-solid-state Li-ion batteries
Journal article2015, Journal of Sol-Gel Science and Technology, 73, p.536-543Publication Atomic layer deposition of ZrO2, TiO2, and ZrTiO4 thin films
Meeting abstract2009, 216th ECS Meeting, 4/10/2009, p.2138Publication Atomic layer deposition-based synthesis of photoactive TiO2 nanoparticle chains by using carbon nanotubes as sacrificial templates
Journal article2014, RSC Advances, (4) 23, p.11648-11653Publication Atomic layers deposited nano-mechanical resonators for silicon photonics
Oral presentation2021, Frontiers of Nanomechanical Systems Workshop 2021Publication Controlling CoSi2 nucleation: the effect of entropy of mixing
Proceedings paper2001, Gate Stack and Silicide Issues in Silicon Processing, 24/04/2000, p.C7.9.1-C7.9.6Publication Controlling CoSi2 nucleation: the effect of entropy of mixing
Oral presentation2000, MRS Spring Meeting Symposium: Gate stack and silicide issues in silicon processing; 2000;Publication CoSi2 formation in the presence of carbon
Journal article2002, Journal of Applied Physics, (92) 3, p.1207-1211Publication CoSi2 formation in the presence of interfacial silicon oxide
Journal article1999, Appl. Phys. Lett., (74) 20, p.2930-32Publication CoSi2 formation in the Ti/Co/SiO2/Si system
Journal article2000, J. Appl. Physics, (88) 1, p.133-140Publication CoSi2 formation using a Ti capping layer - influence of processing conditions on CoSi2 nucleation
Oral presentation2001, Symposium K of the MRS Spring Meeting: Gate Stack and Silicide Issues in Si Processing II; 16-20 April 2001; San Francisco, CA,Publication CoSi2 nucleation in the presence of Ge
Journal article2001, Thin Solid Films, (384) 2, p.243-250Publication Deposition Of Ru and RuO2 flms for DRAM electrode
Meeting abstract2010, 218th ECS Meeting Symposium 'Atomic Layer Deposition Applications 6', 10/10/2010, p.1425Publication E-beam-lithography free plasmonic slot waveguides for on-chip raman spectoscopy
Proceedings paper2018, Conference on Lasers and Electro-Optics - CLEO, 13/05/2018, p.SW3L.6Publication Effect of annealing atmosphere on LiMn2O4 cathodes for thin film Li-ion batteries from aqueous chemical solution deposition
Journal article2016, Journal of Materials Chemistry A, (4) 47, p.18457-18469