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Browsing by Author "Eitoku, Atsuro"

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    Advanced wafer surface cleaning technology

    Mertens, Paul  
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    Vos, Rita  
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    Vereecke, Guy  
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    Arnauts, Sophia  
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    Bearda, Twan
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    De Waele, Rita
    Oral presentation
    2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing Seminar
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    Application of single-wafer wet cleaning prior to epitaxial SiGe process

    Sano, Ken-Ichi
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    Wada, Masayuki
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    Leys, Frederik
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    Loo, Roger  
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    Hikavyy, Andriy  
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    Mertens, Paul  
    Journal article
    2009, Solid State Phenomena, 145-146, p.173-176
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    Cleaning of nanoparticles in semiconductor manufacturing

    Vereecke, Guy  
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    Arnauts, Sophia  
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    Doumen, Geert  
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    Eitoku, Atsuro
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    Fransaer, J.
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    Fyen, Wim
    Oral presentation
    2004, BePCIS Seminar on Selected Topics in Nanotechnology
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    Damage clustering and damage-size distributions after megasonic cleaning

    De Marco, Cinzia
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    Wostyn, Kurt  
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    Bearda, Twan
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    Sano, Ken-Ichi
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    Kenis, Karine  
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    Janssens, Tom
    Proceedings paper
    2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.87-93
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    Damage review on gate stack test structures after high-velocity aerosol cleaning

    Wostyn, Kurt  
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    Sano, Ken-Ichi
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    De Marco, Cinzia
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    Kenis, Karine  
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    Van Den Heuvel, Dieter  
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    Janssens, Tom
    Proceedings paper
    2007, Sematech Surface Preparation and Cleaning Conference, 25/04/2007
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    Influences of oxide loss on contamination removal

    Eitoku, Atsuro
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    Snow, Jim
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    Vos, Rita  
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    Kenis, Karine  
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    Mertens, Paul  
    Oral presentation
    2004, 7th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
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    Influences of oxide loss on contamination removal

    Eitoku, Atsuro
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    Snow, Jim
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    Vos, Rita  
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    Kenis, Karine  
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    Mertens, Paul  
    Proceedings paper
    2005, Ultra Clean Processing of Silicon Surfaces VII: Proceedings of the 7th International Symposium, 20/09/2004, p.177-180
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    New wet process strategies for reduced La2O3 and MgO2 high-k cap-dielectric loss

    Wada, Masayuki
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    Vos, Rita  
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    Claes, Martine  
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    Schram, Tom  
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    Snow, J.
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    Mertens, Paul  
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    Eitoku, Atsuro
    Meeting abstract
    2009, 216th ECS Meeting, 4/10/2009, p.2058
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    Removal of small (<100-nm) particles and metal contamination in single-wafer cleaning tool

    Eitoku, Atsuro
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    Snow, Jim
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    Vos, Rita  
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    Sato, M.
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    Hirae, S.
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    Nakajima, K.
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    Nonomura, M.
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    Imai, M.
    Proceedings paper
    2003, Ultra Clean Processing of Silicon Surfaces 2002 - UCPSS, 16/09/2002, p.157-161
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    Selective wet etching of Hf-based layers

    Snow, Jim
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    Claes, Martine  
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    Paraschiv, Vasile  
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    Kraus, Harald
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    Eitoku, Atsuro
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    Vos, Rita  
    Oral presentation
    2004, Sematech Wafer Clean & Surface Prep Conference
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    Single-wafer wet cleaning for a high particle removal efficiency on hydrophobic surface

    Sano, Ken-Ichi
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    Izumi, A.
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    Eitoku, Atsuro
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    Snow, Jim
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    Kesters, Els  
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    Mertens, Paul  
    Proceedings paper
    2005, Cleaning Technology in Semiconductor Device Manufacturing IX, 16/10/2005, p.134-141
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    State-of-the art cleaning in semiconductor manufacturing

    Mertens, Paul  
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    Arnauts, Sophia  
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    Bearda, Twan
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    Eitoku, Atsuro
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    Fyen, Wim
    ;
    Hellin, David  
    Oral presentation
    2003, 3rd International Workshop on New Trends in Laser Cleaning

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