Browsing by Author "Feenstra, Kees"
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Publication 22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Deep ultraviolet out-of-band contribution in extreme ultraviolet lithography: predictions and experiments
Proceedings paper2011, Extreme Utltraviolet (EUV) Lithography II, 27/02/2011, p.79692OPublication EUV resist contrast loss determination using interference lithography
Publication Evaluation of resist performance for 22nm half-pitch and beyond using EUV interference lithography
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Measuring resist-induced contrast loss using EUV interference lithography
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76362X