Browsing by Author "Ferchichi, Abdelkarim"
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Publication Effect of bake/cure temperature of an advanced organic ultra low-k material on the interface adhesion strength to metal barriers
Journal article2011, Journal of Applied Physics, (109) 7, p.74301Publication Engineering of chemical and physical properties of low-k materials by different wavelength of UV light
Proceedings paper2008, ADMETA: Advanced Metallization Conference, 8/10/2008, p.28-29Publication Evaluation of an advanced organic ultra-low-k material
Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Evaluation of an advanced organic ultra-low-k material
Proceedings paper2009, Advanced Metallization Conference 2008 (AMC 2008), 23/09/2008, p.587-592Publication Impact of plasma exposure on organic low-k materials
;Smirnov, Evgeny ;Ferchichi, Abdelkarim ;Huffman, CraigBaklanov, MikhaïlProceedings paper2010, International Conference on Micro- and Nanoelectronics 2009, 5/10/2009, p.752107Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
;Urbanowicz, Adam ;Shamiryan, Denis ;Marsik, Premysl ;Travaly, YoussefJonas, AlainProceedings paper2009, Advanced Metallization Conference 2008 (AMC 2008), 22/09/2008, p.593-598Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Influence of the ion bombardment of O2 plasmas on low-k materials
Journal article2011, Thin Solid Films, (520) 1, p.464-468Publication Integration of an organic ultra low-k (k=2.2) material
Oral presentation2009, Advanced Metallization Conference - AMCPublication Integration of an organic ultra low-k (k=2.2) material
Proceedings paper2010, Advanced Metallization Conference 2009 - AMC 2009, 13/10/2009, p.173-184Publication Plasma damage and restoration of CVD low-k materials
;Smirnov, Evgeny ;Ferchichi, Abdelkarim ;Zhao, LarryBaklanov, MikhaïlMeeting abstract2009, International Conference Micro- and Nanoelectronics - ICMNE, 5/10/2009, p.P2-31Publication Process compatibility of new advanced low-k dielectric
Meeting abstract2009, 216th ECS Meeting, 1/10/2009, p.2158Publication The influence of N containing plasmas on low-k films
Journal article2011, Microelectronic Engineering, (88) 5, p.627-630Publication The influence of N containing plasmas on low-k films
Oral presentation2010, Materials for Advanced Metalliization Conference - MAM