Browsing by Author "Fischer, Daniel"
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Publication e-beam metrology of thin resist for high NA EUVL
; ; ; ; ; Journal article review2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) SG, p.Art. SG0808Publication Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530PPublication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.021002