Browsing by Author "Fonseca, Carlos"
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Publication Advances and challenges in dual-tone development process optimization
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72740IPublication Advances in dual-tone development for pitch frequency doubling
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400EPublication Advances in process optimization for dual-tone development as a double patterning technique
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication EUV resist requirements: absorbance and acid yield
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727332Publication EUV secondary electron blur at the 22nm half pitch node
Proceedings paper2011, Extreme Ultravioet (EUV) Lithography II, 27/02/2011, p.796904Publication Exploration of new resist chemistries and process methods for enabling dual-tone development
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication Extraction and identification of resist modeling parameters for EUV lithography
Proceedings paper2008, Advances in Resist Materials and Processing Technology XXV, 24/02/2008, p.69230SPublication Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Journal article2011, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 3, p.33004Publication Feasibility study on dual tone development for frequency doubling
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Proceedings paper2011, Extreme Ultraviolet (EUV) Lithography II, 27/02/2011, p.796911Publication Understanding RLS limitations for EUV pre-production stages ; impact of resist dissolution
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010