Browsing by Author "Furukawa, Yukiko"
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Publication Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109
Journal article2002, Microelectronic Engineering, (64) 1_4, p.25-33Publication Characterisation of JSR's spin-on hardmask FF-02
Journal article2003, Microelectronic Engineering, (70) 2_4, p.308-313Publication Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop
Proceedings paper2002, Proceedings of the IEEE International Interconnect Technology Conference, 3/06/2002, p.51-53Publication Dual damascene patterning for full spin-on stack of porous low-K material
Proceedings paper2002, Proceedings of the IEEE International Interconnect Technology Conference, 3/06/2002, p.45-47Publication Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Journal article2002, Microelectronic Engineering, (64) 1_4, p.367-374Publication Molecular beam epitaxy for advanced gate stack materials and processes