Browsing by Author "Goethals, Mieke"
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Publication 0.25 µm optical lithography based on surface imaging and dry development
Publication 157-nm photoresist process optimization for a full-field scanner
Proceedings paper2004-03, Optical Microlithography XVII, 22/02/2004, p.1658-1668Publication 157nm full field imaging
Proceedings paper2003-08, 4th International Symposium on 157nm Lithography, 25/08/2003Publication 157nm resist process performance and integration challenges on a full field scanner
Journal article2004, Journal of Photopolymer Science and Technology, (17) 4, p.655-674Publication 193 nm lithography on a full field scanner
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.278-289Publication 193 nm lithography options: single layer, bilayer and TSI
Goethals, MiekeOral presentation1998, Arf Resists and Related Technologies: Satellite Meeting of the 15th Conference of Photopolymer Science and Technology; 29 June 1Publication A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
Meeting abstract2008, American Vacuum Society Fall Meeting, 19/10/2008Publication Advanced 193 nm step and scan technology
Publication Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Proceedings paper2007, 23rd European Mask and Lithography Conference - EMLC, 23/01/2007, p.653313Publication CD control for 180-nm and 130-nm gate-level lithography
Journal article1996, Microlithography World, Autumn, p.16-21Publication Characterisation of EUV resist related outgassing and contamination
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Characterization of EUV optics contamination due to photoresist related outgassing
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76361WPublication Correlation of EUV optics contamination and the photoresist chemistry
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Proceedings paper2009-12, IEEE International Electron Devices Meeting - IEDM, 7/12/2009, p.301-304Publication Dependence of EUV mask printing performance on blank architecture
Proceedings paper2008-03, Emerging Lithographic Technologies XXII, 24/02/2008, p.69211WPublication Dry Development for 0.25 5m Top Surface Imaging
Publication Dry development for 0.25 μm top surface imaging