Browsing by Author "Hara, Arisa"

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Approaches to Enable Patterning of Tight Pitches towards High NA EUV

Tadatomo, Hiroki
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Dauendorffer, Arnaud
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Onitsuka, Tomoya
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Genjima, Hisashi
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Ido, Yasuyuki
Proceedings paper
2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560F
Impact of local variability on defect-aware process windows

Maslow, Mark John
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Yaegashi, Hidetami
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Frommhold, Andreas
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Schiffelers, Guido
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Wahlisch, Felix
Proceedings paper
2019, Extreme Ultraviolet (EUV) Lithography X, 24/02/2019, p.109570H
LWR reduction by novel lithographic and etch techniques

Kobayashi, Shinji
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Shimura, Satoru
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Kawasaki, Tetsu
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Nafus, Kathleen
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Hatakeyama, Shinichi
Proceedings paper
2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.763914
Understanding the significance of local variability in defect-aware process windows

Maslow, Mark John
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Yaegashi, Hidetami
;
Frommhold, Andreas
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Hara, Arisa
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Cerbu, Dorin
Journal article
2020, IEEE Transactions on Semiconductor Manufacturing, (33) 1, p.42-52