Browsing by Author "Hatakeyama, Shinichi"
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Publication A CDU comparison of double-patterning process options using Monte Carlo simulation
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72741UPublication Advances and challenges in dual-tone development process optimization
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72740IPublication Advances in process optimization for dual-tone development as a double patterning technique
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Effect of PAG distribution on ArF and EUV resist performance
Journal article2009, Journal of Photopolymer Science and Technology, (22) 1_6, p.97-104Publication Feasibility study on dual tone development for frequency doubling
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Image contrast contributions to immersion lithography defect formation and process yield
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.69244WPublication Investigation of EUV process sensitivities for wafer track processing
Proceedings paper2009, Alternative Lithographic Technologies, 22/02/2009, p.727148Publication LWR reduction by novel lithographic and etch techniques
Proceedings paper2010, Advances in Resist Materials and Processing Technology XXVII, 21/02/2010, p.763914Publication Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727347Publication Understanding and improving double patterning CDU through Monte Carlo simulation
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008