Browsing by Author "Heskamp, B."

;

;

;

Heskamp, B.

Proceedings paper

1999, Optical Microlithography XII, 14/03/1999, p.278-289

Publication

Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

Vleeming, Bert

;

Heskamp, B.

;

Finders, Jo

;

Oral presentation

2000, Interface, Poster Session

Publication

ArF step-and-scan exposure system for 0.15-μm and 0.13-μm technology nodes

Mulkens, J.

;

Stoeldraijer, J.

;

Davies, G.

;

Dierichs, M.

;

Heskamp, B.

;

Moers, M. H.

;

George, R. A.

Proceedings paper

1999, Optical Microlithography XII, 14/03/1999, p.506-521

Publication

Introducing 193 nm lithography

Pollers, Ingrid

;

;

;

Goethals, Mieke

;

;

Davies, G.

Proceedings paper

1998, Proceedings of the Microlithography Symposium. Interface '98, 15/11/1998, p.179-198

Publication

Lithographic performance of 193 nm resist

Goethals, Mieke

;

Pollers, Ingrid

;

;

Sugihara, Takashi

;

;

Heskamp, B.

Proceedings paper

1998, 193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book, 14/09/1998, p.P-020

Publication

Recent advancements in 193 nm step and scan lithography

Goethals, Mieke

;

;

Pollers, Ingrid

;

;