Browsing by Author "Houchens, Kevin"
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Publication e-beam metrology of thin resist for high NA EUVL
; ; ; ; ; Journal article review2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) SG, p.Art. SG0808Publication Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle
Publication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Recess metrology challenges for 3D device architectures in advanced technology nodes
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.120530L