Browsing by Author "Inoue, Osamu"
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Publication Enabling CD SEM metrology for 5nm technology node and beyond
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014512Publication Hybrid overlay metrology for high order correction by using CDSEM
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 20/02/2016, p.977824Publication Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
Proceedings paper2015, Metrology, Inspection, and Process Control for Microlithography XXIX, 22/02/2015, p.942408Publication Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97780VPublication Precise measurement of thin film thickness in 3D-NAND device with CD-SEM
Publication SEM based overlay measurement between resist and buried patterns
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97781DPublication SEM based overlay measurement between via patterns and buried M1 patterns using high voltage SEM
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.101451JPublication Variability study with CD-SEM metrology for STT-MRAM: Correlation analysis between physical dimensions and electrical property of the memory element
Publication Variability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element