Browsing by Author "Janssens, Tom"
- Results Per Page
- Sort Options
Publication (A)thermal migration of Ge during junction formation in a-Si layers grown on thin SiGe-buffer layers
Proceedings paper2004, High-Mobility Group-IV Materials and Devices, 12/04/2004, p.273-279Publication (A)thermal migration of Ge during junction formation in s-Si grown on thin SiGe-buffer layers
Oral presentation2004, Silicon Front-End Junction Formation - Physics and TechnologyPublication Accurate electrical activation characterization of CMOS ultra-shallow profiles
Journal article2004, Materials Science and Engineering B, 114-115, p.166-173Publication Acoustic cleaning in nano-electronics
Proceedings paper2008, Acoustics, 29/06/2008, p.556-560Publication Active dopant characterization methodology for Germanium
Proceedings paper2005, Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond., 5/06/2005, p.373-382Publication Advanced phosphorus emitters for high efficiency Si solar cells
Proceedings paper2009, 34th IEEE Photovoltaic Specialists Conference, 7/06/2009, p.878-882Publication Advanced phosphorus emitters for high efficiency Si solar cells
Proceedings paper2009, 24th European Photovoltaic Solar Energy Conference and Exhibition - EPVSEC, 21/09/2009, p.1843-1846Publication An (un)solvable problem in SIMS: B-interfacial profiling
Journal article2003, Applied Surface Science, 203-204, p.371-376Publication An integrated approach for selective emitter formation
Proceedings paper2009, 24th European Photovoltaic Solar Energy Conference and Exhibition - EPVSEC, 21/09/2009, p.1820-1822Publication Assessment of the near-surface profiling capabilities of SIMS
Meeting abstract2003, Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., 27/04/2003, p.165Publication Athermal germanium migration in strained silicon layers during junction formation with solid-phase epitaxial regrowth
Journal article2005, Applied Physics Letters, (86) 8, p.81915Publication Characterization and otimalization of 65nm CMOS technology using scanning spreading resistance microscopy
Meeting abstract2005, Proceedings of the 8th Int. Workshop on the Fabrication , Characterization and Modeling of Ultra Shallow Junctions in Semicond., 5/06/2005, p.55Publication Characterization of (ultra)thin dielectrica
Oral presentation2000, Quantitative Surface Analysis-11; 3-7 July 2000; Surrey, UK.Publication Co-implantation with conventional spike anneal solutions for 45 nm ultra-shallow junction formation
Proceedings paper2005, USJ - The 8th Int. Workshop on the Fabrication, Characterization and Modeling of Ultra Shallow Junctions in Semiconductors, 5/06/2005Publication Correlation between optical and physical depth measurements: errors related to transparent layers
Publication Damage clustering and damage-size distributions after megasonic cleaning
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.87-93Publication Damage review on gate stack test structures after high-velocity aerosol cleaning
; ; ; Janssens, TomProceedings paper2007, Sematech Surface Preparation and Cleaning Conference, 25/04/2007Publication Defect removal, dopant diffusion and activation issues in ion-implanted shallow junctions fabricated in crystalline germanium substrates
Proceedings paper2005, Gettering and Defect Engineering in Semiconductor Technology XI. Proceedings of the 11th International Autumn Meeting, 25/09/2005, p.691-696Publication Development and Integration of a high efficiency baseline leading to 23% IBC cells
Proceedings paper2012, Proceedings of the 2nd International Conference on Crystalline Silicon Photovoltaics - SiliconPV, 3/04/2012, p.638-945Publication Development of high effciency FZ silicon solar cells by application of the i-PERC concept
Proceedings paper2008, 23rd European Photovoltaic Solar Energy Conference and Exhibition, 1/09/2008, p.1600-1603