Browsing by Author "Jonckx, Franky"
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Publication Characterisation of HF-last cleaning of ion-implanted Si surfaces
Journal article1998, Materials Science in Semiconductor Processing, (1) 2, p.107-117Publication Elimination of HF-last cleaning related CoSi2 defects formation
Proceedings paper1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.177-180Publication Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyond
Proceedings paper1996, Silicide Thin Films - Fabrication, Properties, and Applications, 27/11/1995, p.221-231Publication New drying techology for advanced cleaning in IC manufacturing
Proceedings paper1994, Vacuum and Semiconductor Processing Conference, 15/06/1994Publication On the formation of silicides on polyrunners with topography by a two-step silicidation process
Journal article1995, Applied Surface Science, 91, p.378-381Publication Structural and electrical characterization of FeSix-layers (1 < X < 2) prepared by RTA of Fe layers sputtered on Si (100)
Proceedings paper1995, Rapid Thermal and Integrated Processing IV, 17/04/1995, p.389-394Publication Ti-salicide improvement by preamorphization for ULSI applications
Proceedings paper1996, Silicide Thin Films - Fabrication, Properties, and Applications, 27/11/1995, p.89-94