Browsing by Author "Juffermans, Casper"
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Publication 248 nm lithography for the 0.18 μm generation
Proceedings paper1996, Proceedings of the Microlithography Seminar INTERFACE'96, 27/10/1996, p.29-42Publication Application of a new approach to optical proximity correction
Publication Characterization of a projection lens using the extended Nijboer-Zernike approach
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.1392-1399Publication Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Proceedings paper2007-04, International Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA, 23/04/2007Publication Novel aberration monitor for optical lithography
Proceedings paper1999, Optical Microlithography XII, 14/03/1999, p.77-86Publication Optical proximity correction for 0.3 μm i-line lithography
Journal article1996, Microelectronic Engineering, 30, p.141-144